The increasing demand for silicon materials is increasing rapidly with the increasing of photovoltaic industry. The application of silicon materials in photovoltaic also increases the demand for silicon cleaning, but this material needs special silicon cleaning machine to clean it. At the same time, the demand for silicon cleaning machine also increased a lot. But not that all silicon cleaning machines are good, he also has many cleaning methods.

A number of enterprises have developed and produced silicon cleaning machines, so at present, there are many kinds of processes used in solar silicon cleaning on the market, such as ultrasonic cleaning, RCA standard cleaning, megaphone cleaning, high pressure injection, centrifugal injection, plasma cleaning, gas phase cleaning, laser beam cleaning and so on, forming a potential state of blooming a hundred flowers. What cleaning process method is used, it needs to be selected according to the surface state, cleanliness, pollution and so on of different customers on different silicon wafers. According to industry feedback, in many cleaning methods, silicon cleaning machine used more ultrasonic cleaning method and RCA standard cleaning method